Overall Equipment Efficiency Improvement for GaAs Fab Evaporators

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  • Author: Jesus Teran, Daniel Weaver, Heather Knoedler, Lam Luu, Richard Bingle, Brian Alvarez, Joshua Doria, David Holzman, and Juan Velasquez

This paper reviews how six sigma methodology principles and total preventive maintenance (TPM) drains analysis have been utilized to increase overall equipment effectiveness (OEE) on the metal deposition operation in our GaAs wafer fab.

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